Aluminum-based

Aluminum alloy and its composite materials with low density, high specific strength, corrosion resistance and easy surface treatment, etc., is a cost-effective lightweight materials, in recent years, the market demand is strong, the application and development of aluminum alloy powder materials is on the rise.

Niobium pentoxide

1. Physical Properties: White or pale yellow powder, density ~4.6 g/cm³, melting point approximately 1485°C, insoluble in water. 2. Chemical Stability: Acid-resistant, high-temperature oxidation-resistant, slowly dissolves in strong alkalis. 3. Functional Characteristics: High dielectric constant (ε≈40), suitable for electronic ceramics. Excellent photocatalytic activity, can be used to degrade pollutants. Semiconductor properties (band gap ~3.4 eV), suitable for optoelectronic materials. 4. Controllable Morphology: Micrometer to nanometer powders are available, supporting customized morphologies such as spherical and flake-like shapes.

Dysprosium oxide

1. Ultra-high purity: Dy₂O₃≥99.9% (4N grade), very low impurity content (Fe≤50ppm, Ca≤30ppm) 2. Controllable crystal form: Mainly cubic crystal system, excellent thermal stability (melting point ≥2400℃) 3. Uniform particle size: Standard particle size 1-10μm, supporting nano-level or micron-level customization 4. Low hygroscopicity: Water content ≤0.1% under sealed packaging

Tungsten carbide powder

1. Ultra-high hardness: Microhardness ≥2200 HV, excellent wear resistance 2. Precise composition: WC content ≥99.8%, free carbon ≤0.1% 3. Controllable particle size: Standard particle size 0.5-50μm, supports nano-level or micron-level customization 4. High density: Loose density 3.5-5.0g/cm³, suitable for sintering process requirements

Tantalum pentoxide

1. High Purity and Uniformity: Purity ≥99.9% (99.99% and above customizable), extremely low impurity content. Uniform particle size distribution (adjustable D50 0.5-10μm), suitable for precision processing. 2. Excellent Physicochemical Properties: High dielectric constant (ε≈25-50), suitable for high-frequency capacitors and semiconductor thin-film deposition. High temperature resistance (melting point 1872°C), acid and alkali corrosion resistance, strong chemical inertness. 3. Multifunctional Applications: Optics: High refractive index coating material (such as camera lenses, laser devices). Electronics: DRAM capacitor dielectric, key raw material for MLCC (Multilayer Ceramic Capacitors).

Bi2O3

Excellent dielectric properties, high oxygen mobility, large energy gap, high refractive index, significant photoconductivity and photoluminescence, it is a widely used functional material

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316L、17-4PH、304L、MS1、FeSi6.5、FeCrAl、HK30、430